/sci/ - Science & Math

>Longer term, EUV could be further extended by developing tools with an NA higher than 0.55, and hyper-NA systems (NA ≥ 0.75) are under consideration. Shorter wavelengths (6 nm < λ < 7nm) are also being assessed. This is sometimes referred to as Beyond EUV (BEUV).
>Changing to a shorter wavelength would be a much bigger change than increased NA and be much more challenging
>New light sources, multilayer coatings and photoresists would be needed for shorter wavelength lithography. Maintaining the same
level of photon shot noise at the shorter wavelength would require a doubling of light energy delivered to the wafer, which would
greatly increase the heating of masks and mirrors in the projection optic
EARTHERS FINISHED AND BANKRUPT
CAN'T COMPETE WITH SPACE LITHOGRAPHY